JPH0323629B2 - - Google Patents
Info
- Publication number
- JPH0323629B2 JPH0323629B2 JP58174770A JP17477083A JPH0323629B2 JP H0323629 B2 JPH0323629 B2 JP H0323629B2 JP 58174770 A JP58174770 A JP 58174770A JP 17477083 A JP17477083 A JP 17477083A JP H0323629 B2 JPH0323629 B2 JP H0323629B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- width
- particles
- particle flow
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17477083A JPS6067659A (ja) | 1983-09-21 | 1983-09-21 | 薄膜形成方法 |
US06/649,858 US4601922A (en) | 1983-09-21 | 1984-09-12 | Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes |
DE19843434433 DE3434433A1 (de) | 1983-09-21 | 1984-09-19 | Verfahren und vorrichtung zum erzeugen einer duennen schicht auf einem substrat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17477083A JPS6067659A (ja) | 1983-09-21 | 1983-09-21 | 薄膜形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6067659A JPS6067659A (ja) | 1985-04-18 |
JPH0323629B2 true JPH0323629B2 (en]) | 1991-03-29 |
Family
ID=15984362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17477083A Granted JPS6067659A (ja) | 1983-09-21 | 1983-09-21 | 薄膜形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6067659A (en]) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824544A (en) * | 1987-10-29 | 1989-04-25 | International Business Machines Corporation | Large area cathode lift-off sputter deposition device |
JPH0745711B2 (ja) * | 1987-12-10 | 1995-05-17 | 株式会社日立製作所 | 高指向性蒸着装置 |
US5171412A (en) * | 1991-08-23 | 1992-12-15 | Applied Materials, Inc. | Material deposition method for integrated circuit manufacturing |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5333640A (en) * | 1976-09-10 | 1978-03-29 | Hitachi Ltd | Formation of orientation control film for liquid crystal display element |
JPS53117559U (en]) * | 1977-02-24 | 1978-09-19 |
-
1983
- 1983-09-21 JP JP17477083A patent/JPS6067659A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6067659A (ja) | 1985-04-18 |
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