JPH0323629B2 - - Google Patents

Info

Publication number
JPH0323629B2
JPH0323629B2 JP58174770A JP17477083A JPH0323629B2 JP H0323629 B2 JPH0323629 B2 JP H0323629B2 JP 58174770 A JP58174770 A JP 58174770A JP 17477083 A JP17477083 A JP 17477083A JP H0323629 B2 JPH0323629 B2 JP H0323629B2
Authority
JP
Japan
Prior art keywords
substrate
width
particles
particle flow
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58174770A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067659A (ja
Inventor
Yasuo Morohoshi
Akira Nishiwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17477083A priority Critical patent/JPS6067659A/ja
Priority to US06/649,858 priority patent/US4601922A/en
Priority to DE19843434433 priority patent/DE3434433A1/de
Publication of JPS6067659A publication Critical patent/JPS6067659A/ja
Publication of JPH0323629B2 publication Critical patent/JPH0323629B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP17477083A 1983-09-21 1983-09-21 薄膜形成方法 Granted JPS6067659A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17477083A JPS6067659A (ja) 1983-09-21 1983-09-21 薄膜形成方法
US06/649,858 US4601922A (en) 1983-09-21 1984-09-12 Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes
DE19843434433 DE3434433A1 (de) 1983-09-21 1984-09-19 Verfahren und vorrichtung zum erzeugen einer duennen schicht auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17477083A JPS6067659A (ja) 1983-09-21 1983-09-21 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS6067659A JPS6067659A (ja) 1985-04-18
JPH0323629B2 true JPH0323629B2 (en]) 1991-03-29

Family

ID=15984362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17477083A Granted JPS6067659A (ja) 1983-09-21 1983-09-21 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS6067659A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4824544A (en) * 1987-10-29 1989-04-25 International Business Machines Corporation Large area cathode lift-off sputter deposition device
JPH0745711B2 (ja) * 1987-12-10 1995-05-17 株式会社日立製作所 高指向性蒸着装置
US5171412A (en) * 1991-08-23 1992-12-15 Applied Materials, Inc. Material deposition method for integrated circuit manufacturing

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333640A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Formation of orientation control film for liquid crystal display element
JPS53117559U (en]) * 1977-02-24 1978-09-19

Also Published As

Publication number Publication date
JPS6067659A (ja) 1985-04-18

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